ASTROSUMMIT-2026

Dr. Shuxia Zhao is an Associate Professor in the School of Physics at Dalian University of Technology, China, and a Master’s tutor specializing in plasma physics and computational plasma modeling. She received her Bachelor’s and Master’s degrees in Physics and Materials Physics from Hebei Normal University, and completed her Ph.D. in Plasma Physics at Dalian University of Technology in 2010. Following her doctoral studies, she worked as a Postdoctoral Researcher at the University of Antwerp, Belgium (2010–2012). Since 2013, she has been serving as an Associate Professor at Dalian University of Technology. Her research focuses on low-temperature plasma physics, including DC and RF plasma sources, hollow cathode discharges, and inductively coupled plasmas. She is particularly experienced in fluid, particle, and hybrid simulation methods for investigating plasma discharge mechanisms, plasma–surface interactions, and silicon etching processes. Dr. Zhao is also skilled in developing simulation codes and performing plasma modeling using tools such as COMSOL and HPEM. She has authored and co-authored 40+ peer-reviewed publications in international journals in the fields of plasma science, applied physics, and plasma technology.